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Formation of low temperature silicon dioxide films using chemical vapor deposition /

Thesis (M.S.)--Rochester Institute of Technology, 1991. / Typescript. Includes bibliographical references (leaves 165-168).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/26812667
Date January 1991
CreatorsChen, Hsiao-Hui.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis.

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