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Phosphorus implants for off-state improvement of SOI CMOS fabricated at low temperature /

Thesis (M.S.)--Rochester Institute of Technology, 2009. / Typescript. Includes bibliographical references (leaves 89-91).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/425958324
Date January 2009
CreatorsSingh, Siddhartha.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis.

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