Caracterização de filmes finos de TiOsub(2) obtidos por deposição química em fase vapor / Characterization of TiOsub(2)thin films obtained by metal-organic chemical vapour deposition

Description

Submitted by Claudinei Pracidelli ([e-mail]) on 2015-06-09T18:48:47Z
No. of bitstreams: 0 / Made available in DSpace on 2015-06-09T18:48:47Z (GMT). No. of bitstreams: 0 / Dissertação (Mestrado em Tecnologia Nuclear) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN-CNEN/SP

Links & Downloads

1. http://repositorio.ipen.br:8080/xmlui/handle/123456789/23704

Tags

THIN FILMS

SILICON

TITANIUM OXIDES

CHEMICAL VAPOR DEPOSITION

X-RAY DIFFRACTION

SCANNING ELECTRON MICROSCOPY

CRYSTAL STRUCTURE

MORPHOLOGY

VOLTAMETRY

Additional Fields

Identifer	oai:union.ndltd.org:IBICT/oai:10.40.40.102:123456789/23704
Date	09 June 2015
Creators	CARRIEL, RODRIGO C.
Contributors	Orientador: Marina Fuser Pillis
Source Sets	IBICT Brazilian ETDs
Detected Language	English
Type	info:eu-repo/semantics/publishedVersion, info:eu-repo/semantics/masterThesis
Format	56
Source	reponame:Repositório Institucional do IPEN, instname:Instituto de Pesquisas Energéticas e Nucleares, instacron:IPEN
Coverage	N
Rights	info:eu-repo/semantics/openAccess