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Infrared studies of trenches etched in silicon

<p>Previous studies of protein adsorption on silicon have been restricted by the choice of a simple structure or large surface for protein to adsorb on. The aim of this project was to develop an optical model for more complex nanostructures in form of trenches etched in silicon and then examine if a protein would adsorb to the surface. The method used was infrared ellipsometry. The experimental values from measurements on the sample were used to develop an optical model that represent the nanostructure. A three-layered biaxial model proved to be accurate. One sample was then exposed to the protein albumin and then measured upon again. The results before and after protein adsorption were compared and a small optical signature was found were it could be expected for this specific protein. This shows that it is possible to detect adsorption in a complex nanostructure and to develop an accurate optical model for said structure.</p>

Identiferoai:union.ndltd.org:UPSALLA/oai:DiVA.org:liu-10386
Date January 2007
CreatorsKarlsson, Lars
PublisherLinköping University, The Department of Physics, Chemistry and Biology, Institutionen för fysik, kemi och biologi
Source SetsDiVA Archive at Upsalla University
LanguageEnglish
Detected LanguageEnglish
TypeStudent thesis, text

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