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The evolution of sub-micron surface topography during the plasma etching of selected materials

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.284839

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:284839
Date	January 1998
Creators	Cui, Naiyi
Publisher	University of Ulster
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation