Atomic/plasma polymerization technology is widely used in various technical fields. This work is focused to use the PE-CVD technology in the field of formation of interphase and adhesive layers, which are developed into layered nanostructures. To ensure reproducible chemical and physical properties of the materials, the deposition process was monitored by mass spectrometry. Vapours of the pure tetravinylsilane, or a mixture of these vapours with oxygen, was used as a precursor for atomic polymerization, which results in the thin films with a large variability of properties. Physical and chemical properties were varied by the effective power delivered to the plasma discharge. The deposited films were analyzed from different perspectives using several methods (in situ spectroscopic ellipsometry, FTIR, nanoindentation, AFM). The removal of hydrogen atoms from the carbon-silicon network results in increased crosslinking of the material, which controls the mechanical and optical properties of the deposited layers. From the precisely defined a-CSi:H and a-CSiO:H materials, layered nanostructures composed of 3 and 7 individual layers was subsequently constructed. These nanostructures were analyzed by XPS and RBS to determine the atomic concentrations of carbon, silicon, oxygen and their binding states.
| Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:433198 |
| Date | January 2020 |
| Creators | Bránecký, Martin |
| Contributors | Trunec, David, Kylián,, Ondřej, Čech, Vladimír |
| Publisher | Vysoké učení technické v Brně. Fakulta chemická |
| Source Sets | Czech ETDs |
| Language | Slovak |
| Detected Language | English |
| Type | info:eu-repo/semantics/doctoralThesis |
| Rights | info:eu-repo/semantics/restrictedAccess |
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