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Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology

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Identiferoai:union.ndltd.org:UTEXAS/oai:repositories.lib.utexas.edu:2152/11036
Date28 April 2011
CreatorsLee, Sungjoo
Source SetsUniversity of Texas
LanguageEnglish
Detected LanguageEnglish
Formatelectronic
RightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works., Restricted

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