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Depozice Al a AlN ultratenkých vrstev na křemíkový a grafenový substrát / The deposition of Al and AlN ultrathin layers on silicon and graphene substrate

This master's thesis deals with preparation and analysis of ultrathin films of aluminum and aluminum nitride. Films were prepared by effusion cells designed in previous bachelor's thesis. Cell construction and testing is included in this thesis. Behavior of aluminum on silicon dioxide, silicon and graphene was studied. Preparation of aluminum nitride by effusion cell and nitrogen ion source is described.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:254277
Date January 2016
CreatorsŘihák, Radek
ContributorsČech, Vladimír, Mach, Jindřich
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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