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Diffusion profiles of chromium and vanadium ions implanted into (100) single-crystalline silicon

No description available.
Identiferoai:union.ndltd.org:ucf.edu/oai:stars.library.ucf.edu:rtd-2417
Date01 October 2001
CreatorsZhang, Peng
PublisherSTARS
Source SetsUniversity of Central Florida
LanguageEnglish
Detected LanguageEnglish
Typetext
SourceRetrospective Theses and Dissertations

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