Chemical vapor deposition reactor design and process optimization for the deposition of copper thin films /

Description

Thesis (M.S.)--Rochester Institute of Technology, 1994. / Typescript. Includes bibliographical references (leaves 134-137).

Links & Downloads

1. http://hdl.handle.net/1850/11578

Tags

Vapor-plating. Thin films Copper.

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/31723537
Date	January 1994
Creators	Stephens, Alan Thomas.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Online version of thesis.