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Charakterizace struktur připravených selektivním mokrým leptáním křemíku / Characterization of structures fabricated by selective wet etching of silicon

The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:231496
Date January 2014
CreatorsMetelka, Ondřej
ContributorsMikulík, Petr, Šamořil, Tomáš
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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