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Fabrication and Characteristic Optimization of TFBAR Filters

In this study, the ladder-type filters based on back-etched thin film bulk acoustic resonator (TFBAR) were fabricated with several patterns to investigate the influence on their frequency responses. The highly c-axis oriented ZnO films were deposited on silicon substrates by reactive RF magnetron sputtering. The optimal two-step deposition temperature for ZnO films is 100 ¢J, which is obtained by means of SEM AFM, and XRD analysis.
According to the experimental results, it leads to good resonance responses as TFBAR filters are fabricated with the patterns of large resonance area, two stages
and the ratio of shunt/series resonance area is equal to two. Herein, conventional thermal annealing (CTA) was adopted to improve the frequency responses of
TFBAR filters. Because CTA treatment can release stress and improve surface roughness of ZnO and Pt films, it enhances the frequency responses of TFBAR
filters. The optimal CTA treatment temperature for TFBAR filters is 400 ¢J. Finally, TFBAR filters show the good performances with insertion loss of -8.138 dB, band rejection of 10.9 dB and bandwidth of 37.125 MHz.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0817109-160127
Date17 August 2009
CreatorsChen, Shin-Hua
ContributorsChien-Chuan Cheng, Rurng-Sheng Guo, Ying-Chung Chen, Cheng-Fu Yang, Hsiung Chou
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0817109-160127
Rightswithheld, Copyright information available at source archive

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