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Growth of nonpolar ZnO films on LiGaO2 substrate by chemical vapor deposition method

Nonpolar m-plane ZnO epitaxial film with [10-10] orientation and a-plane ZnO epitaxial film with [11-20]was successfully grown on a large-size [100] and [010] LiGaO2 (LGO) single crystal substrate by chemical vapor deposition (CVD) method.
The dependence of growth characteristics on the different growth conditions was investigated. Following the CVD growth, the surface morphologies and epi-film crystallinity were studied by a scanning electron microscopy and X-ray diffraction. Room temperature photoluminescence spectra exhibit a strong near-band-edge emission peak at 377 nm with a negligible green band. Further structural characterizations and defect analysis of nonpolar ZnO material were performed using transmission electron microscope (TEM).
This thesis included two different orientations ZnO film. First was ZnO[10-10], which can get good epi-film crystallinity and flat surface morphologies under 750¢J. And we tried to grow under different pressure, the data shown that higher pressure(more than 150 torr) tended to grow ZnO[10-10] orientation on LGO[100] substrate. The other one was ZnO[11-20]. We can get flat and continuous ZnO[11-20] film under 680¢J.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0817110-171947
Date17 August 2010
CreatorsLiao, Yen-Hsiang
ContributorsDer-Shin Gan, Liu-Wen Chang, Ming-Chi Chou, Jih-Jen Wu, Pou-Yan Shen
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0817110-171947
Rightsnot_available, Copyright information available at source archive

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