In this study, the tansparent conductive oxide (TCO) multilayer film AZO/Ag-Ti/AZO was fabricated with Ag-Ti alloy as conducting layer and AZO as anti-reflective material. The metal alloy was deposited by DC magnetron sputtering, and the AZO film deposition was performed by spin-coating technique and dried at suitable temperature. The thicknesses of Ag-Ti and AZO thin films were varied to fabricate AZO/Ag-Ti/AZO multilayer films. The microstructures of the multilayer films were observed by SEM and AFM. Sheet resistance was measured by using four-point probe. Optical transmittance was measured in the visible range by uv-vis spectrophotometer.
The results show that as the top of AZO thickness is 50 nm, intermediate Ag-Ti metal laminated to 9 nm, and the bottom of the AZO is 35 nm, the transmittance of multilayer film AZO/Ag-Ti/AZO can reach 78.92%, and the sheet resistance is 1.86£[/¡¼. When thermal annealing process was carried out to the bottom AZO film, the worse characteristics of the transmittance and resistance of the performed multilayer film were resulted.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0823110-075333 |
| Date | 23 August 2010 |
| Creators | You, Chieh-chun |
| Contributors | Shoou-jinn Chang, Chien-Jung Huang, Cheng-Fu Yang, Ying-chung Chen, Wen-tai Lin |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0823110-075333 |
| Rights | not_available, Copyright information available at source archive |
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