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Characterizaton of Triethoxyfluorosilane and Tetraethoxysilane Based Aerogels

Aerogels are highly porous, low dielectric constant (low k) materials being considered by the semiconductor industry as an interlayer dielectric. Low k materials are needed to overcome capacitance problems that limit device feature sizes. Precursors triethoxyfluorosilane (TEFS) and tetraethoxysilane (TEOS) were used to prepare bulk aerogels. Samples were prepared by sol-gel methods, and then carbon dioxide supercritically-dried. Effects of varying the water to precursor ratio were studied with respect to aerogel properties and microstructure. Methods of analysis for this study include FTIR-ATR, TEM, RBS, EDS, SEM, dielectric constant determination by impedance and surface area by gas adsorption. Si-F bonds were determined to be present in both acid- and base-catalyzed TEFS as well as HF-catalyzed TEOS. Fluorine promotes a fractal network microstructure as opposed to a particle-like microstructure. Surface area and dielectric constant were determined to increase slightly with increases in the water to precursor ratio.

Identiferoai:union.ndltd.org:unt.edu/info:ark/67531/metadc2999
Date12 1900
CreatorsRoepsch, Jodi Ann
ContributorsReidy, Richard, Brostow, Witold, 1934-, D'Souza, Nandika A., Gnade, Bruce
PublisherUniversity of North Texas
Source SetsUniversity of North Texas
LanguageEnglish
Detected LanguageEnglish
TypeThesis or Dissertation
FormatText
RightsUse restricted to UNT Community, Copyright, Roepsch, Jodi Ann, Copyright is held by the author, unless otherwise noted. All rights reserved.

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