Return to search

Plasmochemické úpravy oxidických polovodičových fotoanod / Plasmochemical treatment of photoanodes with semiconducting oxide layer

This diploma thesis deals with a plasmochemical treatment of photoanodes with an active layer containing TiO2 deposited on two different substrates by material printing. The plasmochemical treatment was performed by a low-temperature ambient-air plasma using a diffuse coplanar surface barrier discharge (DCSBD). The experimental part is focused on the investigation of DCSBD influence on the fabricated photoanodes photoelectrochemical properties, and the influence of plasma treatment time. Process optimization was achieved by height adjustment of the electrode. The processed coatings were electrochemically investigated by linear sweep voltammetry and chronoamperometry.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:376794
Date January 2018
CreatorsĎurašová, Zuzana
ContributorsZita, Jiří, Dzik, Petr
PublisherVysoké učení technické v Brně. Fakulta chemická
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

Page generated in 0.0027 seconds