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Structure evolution, properties, and application of alumina films deposited by PECVD /

Zugl.: Aachen, Techn. Hochsch., 2005.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/76773930
Date January 2005
CreatorsKurapov, Denis.
PublisherAachen : Shaker,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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