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Elektrostatické vychylovací a korekční systémy / Electrostatic Deflection and Correction Systems

The aim of this master's thesis is to explore and study dynamic aberration correction options in electron-beam lithography systems. For the calculations, the thesis uses the optical column of the BS600 electron-beam writer. The thesis focuses on corrections of the third order field curvature, astigmatism, and distortion aberrations of the currently used magnetic deflection system and a newly designed electrostatic deflection system. The parameters of the two deflection and correction systems were compared.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:232048
Date January 2015
CreatorsBadin, Viktor
ContributorsOral, Martin, Zlámal, Jakub
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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