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Pattern Formation and Phase Behavior in PS-B-SI Containing Block Copolymer Thin Film

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:akron1364835896
Date18 June 2013
CreatorsHsieh, I-Fan
PublisherUniversity of Akron / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageEnglish
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=akron1364835896
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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