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Development and Characterization of Layered, Nitrogen-Doped Hafnium Oxide and Aluminum Oxide Films for Use as Wide Temperature Capacitor Dielectrics

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:dayton1429979783
Date03 June 2015
CreatorsDeCerbo, Jennifer N.
PublisherUniversity of Dayton / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageEnglish
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=dayton1429979783
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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