Characterization of High-K gate dielectrics based on HfO2 and TiO2 for CMOs application

Description

Thesis (Ph.D.)--North Carolina State University. / Includes vita. Includes bibliographical references.

Links & Downloads

1. http://www.lib.ncsu.edu/theses/available/etd-11042007-152159/unrestricted/etd.pdf

Tags

North Carolina State University

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/182728620
Date	January 2007
Creators	Lee, Sanghyun.
Source Sets	OCLC
Language	English
Detected Language	English