The aim of this master's thesis is to explore and study dynamic aberration correction options in electron-beam lithography systems. For the calculations, the thesis uses the optical column of the BS600 electron-beam writer. The thesis focuses on corrections of the third order field curvature, astigmatism, and distortion aberrations of the currently used magnetic deflection system and a newly designed electrostatic deflection system. The parameters of the two deflection and correction systems were compared.
Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:232048 |
Date | January 2015 |
Creators | Badin, Viktor |
Contributors | Oral, Martin, Zlámal, Jakub |
Publisher | Vysoké učení technické v Brně. Fakulta strojního inženýrství |
Source Sets | Czech ETDs |
Language | Czech |
Detected Language | English |
Type | info:eu-repo/semantics/masterThesis |
Rights | info:eu-repo/semantics/restrictedAccess |
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