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Characterization of growth and thermal behaviors of thin films for the advanced gate stack grown by chemical vapor deposition

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52933916
Date January 2002
CreatorsJeon, Taek Soo.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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