Agent based diagnostic system for the defect analysis during chemical mechanical polishing (CMP)

Description

Zugl.: Stuttgart, Univ., Diss., 2005

Links & Downloads

1. http://deposit.d-nb.de/cgi-bin/dokserv?idn=976561247
2. http://elib.uni-stuttgart.de/opus/volltexte/2005/2377/pdf/Diss_Kumar_hs.pdf
3. http://elib.uni-stuttgart.de/opus/volltexte/2005/2377/

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/181483673
Date	January 2005
Creators	Kumar, Akhauri Prakash
Publisher	Heimsheim Jost-Jetter
Source Sets	OCLC
Language	English
Detected Language	English