Return to search

Theoritical determination of optimum split-filter exposures for color-correction masks /

Thesis (M.S.)--Rochester Institute of Technology, 1982. / Typescript.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/25822498
Date January 1982
CreatorsChen, Jang-Fun.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

Page generated in 0.0018 seconds