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Doping and Ohmic Contacts of Arsenide Compound Semiconductors by Molecular Beam Epitaxy

Abstract
The theme of this thesis is the MBE growth of doped arsenide compound semiconductor layers including uniformly doped layers and a modulation-doped heterostructure. The Hall measurement system has been set up to measure the carrier concentration and mobility of these samples. We have also studied the ohmic contacts on epitaxial InGaAs layers by TLM method.
For uniformly doped samples, the experimental relation between doping concentration and MBE cell temperature have been established, and are in good agreement with reported results. In the experiment on GaAs/AlGaAs modulation-doped heterostructure, an electron mobility of 27000[cm2/(V•s)] was obtained by cooling the sample down to 170K with liquid nitrogen. This result is consistent with published results. For P-type ohmic contacts on InGaAs, a comparison between two metal layer compositions of Cr+Zn+Au and Cr+Zn+Cr+Au was made. The Cr+Zn+Cr+Au layer gave a lowest specific contact resistance of 3.38¡Ñ10-6(ohm•cm2) at an annealing temperature of 360¢J. A N-type ohmic contact of Au+Ge+Au was also investigated. This metal layer has a lowest specific contact resistance of 9.75¡Ñ10-7(ohm•cm2) without annealing.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0626102-201622
Date26 June 2002
CreatorsWang, Hung-Sen
ContributorsLi-Wei Tu, Tsong-Sheng Lay, Tao-Yuan Chang, Ming-Kwei Lee, Yeong-Her Wang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0626102-201622
Rightsnot_available, Copyright information available at source archive

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