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Konstrukce spektroskopického systému pro systém reaktivního iontového leptání / Mechanical and optical design of spectroscopic system for reactive ion etching system

Measurement of absorption spectra of plasma during reactive ion etching enables characterization of etched species and control over the etching process. Aim of this diploma thesis is to design spectroscope with Czerny-Turner configuration for reactive ion etching system. Developed spectroscope achieves 1 nm resolution in 350-800 nm range. Device was tested during reactive ion etching of silicon.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:400965
Date January 2019
CreatorsŠilhan, Lukáš
ContributorsDostál, Zbyněk, Šerý, Mojmír
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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