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Study of ion implantation damage in silicon wafers using phonons

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.332086

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:332086
Date	January 1992
Creators	Strickland, Keith R.
Publisher	Lancaster University
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation