This thesis covers nanofabrication of central stops for application in soft X-ray imaging using electron-beam lithography for pattern definition. Central stops are small scale optical components used in combination with an order sorting aperture to eliminate the higher order and zeroth order of light after diffraction from a Fresnel zone plate. The main objectives of this study were to produce central stops with the desired parameters and to obtain an understanding of the nanofabrication process. A challenge which was encountered during the fabrication of the central stops was uncertainties in electroplating time, resulting in multiple plating rounds and in turn impacting the quality of the nanostructures. Another challenge which presented itself was that the structures disappeared on the chip with an uneven resist layer, suggesting that the resist layer’s smoothness is important. A key consideration when fabricating structures on this small scale is therefore to ensure the smoothness of the resist layer. Despite these challenges, one chip was successfully fabricated and could likely be used in the optical system for the SoftiMAX beamline, a beamline used for X-ray imaging at MAX IV, a fourth generation synchrotron radiation facility in Lund. In summary, recommendations for future replications and research would be to use chips with evenly coated resist, to make sure to only electroplate once and, if working with similar structures and parameters, to electroplate for a longer time than calculations suggest.
| Identifer | oai:union.ndltd.org:UPSALLA1/oai:DiVA.org:kth-349351 |
| Date | January 2024 |
| Creators | Jänes, Linn |
| Publisher | KTH, Skolan för teknikvetenskap (SCI) |
| Source Sets | DiVA Archive at Upsalla University |
| Language | English |
| Detected Language | English |
| Type | Student thesis, info:eu-repo/semantics/bachelorThesis, text |
| Format | application/pdf |
| Rights | info:eu-repo/semantics/openAccess |
| Relation | TRITA-SCI-GRU ; 2024:169 |
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