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Microstructural effects on stress in thin films

Zugl.: Stuttgart, Univ., Diss., 2008.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/316284923
Date January 2008
CreatorsWohlschlögel, Markus Albin,
Publisher[S.l. : s.n.],
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeOnline-Publikation.
SourceKostenfrei

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