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Deposition of functional thin films by plasma processes

An aim of this work is a research of a deposition process of indium tin oxide by plasma assisted methods. The thesis deals with plasma diagnostics, e.g. Langmuir probe diagnostics and optical emission spectroscopy, as well as describes experiments of film deposition including their diagnostics, e.g. absorption spectroscopy, X-ray diffractometry and atomic force microscopy.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:262725
Date January 2016
CreatorsSEZEMSKÝ, Petr
Source SetsCzech ETDs
LanguageEnglish
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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