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Interstitial reactions in electron irradiated carbon-doped silicon

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Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:233143
Date January 1988
CreatorsChappell, S. P.
PublisherUniversity of Reading
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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