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Photoresist development on SiC and its use as an etch mask for SiC plasma etch

Thesis (M.S.) -- Mississippi State University. Department of Electrical and Computer Engineering. / Title from title screen. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/51974739
Date January 2002
CreatorsMishra, Ritwik.
PublisherMississippi State : Mississippi State University,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeElectronic books Electronic resources Electronic theses/dissertations Master's theses

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