Return to search

Applications of stress from boron doping and other challenges in silicon technology

Thesis (M.S.)--University of Florida, 2005. / Title from title page of source document. Document formatted into pages; contains 139 pages. Includes vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/71315333
Date January 2005
CreatorsRandell, Heather Eve.
Publisher[Gainesville, Fla.] : University of Florida,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

Page generated in 0.0021 seconds