In this study, we have investigated the effect of substrate temperature, use of adhesive layer, deposition rate, annealing and substrate prebaking on the morphology of gold films deposited onto quartz surfaces. For the film growth, physical vapor deposition methods namely electron beam and thermal depositions have been used. Surface morphology of the films have been characterized with atomic force microscopy. Our aim was to confirm the general trends observed for these parameters in our evaporator system for a limited working range in order to produce gold films which are suitable to be used simultaneously for quartz crystal microbalance and helium atom diffraction measurements.
At the end of this study, we confirmed the general trends regarding the effect of these parameters stated in literature except annealing process. We obtained a minimum 170 nm2 atomically flat surface with a roughness value smaller than 0.200 nm by thermal deposition method.
| Identifer | oai:union.ndltd.org:METU/oai:etd.lib.metu.edu.tr:http://etd.lib.metu.edu.tr/upload/12612198/index.pdf |
| Date | 01 July 2010 |
| Creators | Ozkan, Berrin |
| Contributors | Danisman, Mehmet Fatih |
| Publisher | METU |
| Source Sets | Middle East Technical Univ. |
| Language | English |
| Detected Language | English |
| Type | M.S. Thesis |
| Format | text/pdf |
| Rights | To liberate the content for METU campus |
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