Return to search

Tailoring fluorene-based oligomers for micron and sub-micron sized photopatterning

Univ., Diss., 2009--Bayreuth.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/643177270
CreatorsScheler, Esther.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

Page generated in 0.0016 seconds