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New approaches in optical lithography technology for subwavelength resolution /

Thesis (M.S.)--Rochester Institute of Technology, 2005. / Typescript. Includes bibliographical references (leaves 94-102).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/62457048
Date January 2005
CreatorsKang, Hoyoung.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceLink to online version

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