The low temperature oxidation behavior of Si(₁-[subscript x]) Ge[subscript x] thin films in a fluorinated ambient /

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Thesis (Ph. D.)--Lehigh University, 1997. / Includes vita. Bibliography: leaves 266-279.

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/37948939
Date	January 1997
Creators	Kilpatrick, Stephen James,
Source Sets	OCLC
Language	English
Detected Language	English
Type	Academic dissertations