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Aplikace KPM na povrchu grafén/Si modifikovaném metodou FIB / Application of KPM on Graphene/Si Surface Modified by FIB method

This diploma thesis is focused on the application of Kelvin probe microscopy on graphene fabricated by the chemical vapour deposition. The theoretical part of the thesis deals with basic principles of Kelvin force microscopy and focus ion beam. Further, basic properties of graphene and its possible fabrication methods are discussed. The experimental part is focused on the surface potential measurements on graphene membranes fabricated on the substrate modified by focus ion beam. Finally, atomic force microscope lithography was used for nanopatterning of graphene sheets.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:230836
Date January 2013
CreatorsKonečný, Martin
ContributorsRezek, Bohuslav, Bartošík, Miroslav
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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