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Interakce pomalých elektronů s grafenovými polem řízenými tranzistory / Interaction of low-energy electrons with graphene field effect transistors

This diploma thesis is focused on fabrication of graphene field-effect transistors, characterisation of their transport properties and investigation of low-energy electron beam influence on the devices' properties under UHV conditions. The theoretical part of this work describes graphene fabrication methods, options of graphene transfer onto the substrates for graphene field-effect transistor manufacture. Furthermore, model of graphene doping via electrostatic interaction or photon, resp. electron beam exposition is explained. The experimental part of this work consist of manufacture of the graphene field-effect transistor in order to examine the change of its transport properties induced by doping of the graphene via low-energy electron beam exposition.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:402578
Date January 2019
CreatorsVysocký, Filip
ContributorsKunc, Jan, Čechal, Jan
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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