Return to search

Current transport mechanism of hafnium oxide films prepared by direct sputtering /

Thesis (M. Phil.)--Hong Kong University of Science and Technology, 2003. / Includes bibliographical references. Also available in electronic version. Access restricted to campus users.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/54281321
Date January 2003
CreatorsNg, Kit Ling.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView Abstract or Full-Text.

Page generated in 0.0017 seconds