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Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52930755
Date January 2002
CreatorsGopalan, Sundararaman.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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