Yuen, Ying Kit. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2007. / Includes bibliographical references (leaves 90-96). / Abstracts in English and Chinese. / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Electron Field Emission --- p.1 / Chapter 1.2 --- Theory of Electron Field Emission --- p.4 / Chapter 1.3 --- Fowler Nordheim Model for Electron Field Emission in Metals --- p.5 / Chapter 1.4 --- Factors Affecting the Field Emission Properties --- p.7 / Chapter 1.4.1 --- Surface Morphology --- p.7 / Chapter 1.4.2 --- Electrical Inhomogeneity --- p.7 / Chapter 1.5 --- Goal of this Project --- p.9 / Chapter Chapter 2 --- Sample Preparation and Characterization Methods / Chapter 2.1 --- Sample Preparation --- p.11 / Chapter 2.1.1 --- MEVVA Ion Implantation System --- p.13 / Chapter 2.1.2 --- TRIM Simulation --- p.17 / Chapter 2.1.3 --- Implantation Conditions --- p.19 / Chapter 2.2 --- Characterization Methods --- p.21 / Chapter 2.2.1 --- AFM - Atomic Force Microscopy --- p.21 / Chapter 2.2.2 --- C-AFM ´ؤ Conducting Atomic Force Microscopy --- p.23 / Chapter 2.2.3 --- RBS - Rutherford Backscattering Spectrometry --- p.23 / Chapter 2.2.4 --- TEM - Transmission Electron Microscopy --- p.26 / Chapter 2.2.5 --- Field Emission Measurement --- p.27 / Chapter Chapter 3 --- Field Emission Properties of Co-Si02 / Chapter 3.1 --- Introduction --- p.29 / Chapter 3.2 --- RBS results --- p.30 / Chapter 3.3 --- Experimental results of as-implanted Co-SiO2 samples --- p.32 / Chapter 3.3.1 --- AFM and results --- p.32 / Chapter 3.3.2 --- Field emission properties of as-implanted Co-Si02 --- p.35 / Chapter 3.4 --- Step-like and jump-like features in the J-E plots --- p.39 / Chapter 3.5 --- Chapter Summary --- p.43 / Chapter Chapter 4 --- Field Emission Properties of Fe-SiO2 / Chapter 4.1 --- Introduction --- p.45 / Chapter 4.2 --- RBS results --- p.46 / Chapter 4.3 --- Experimental results of as-implanted Fe-SiO2 samples --- p.48 / Chapter 4.3.1 --- AFM and results --- p.48 / Chapter 4.3.2 --- Field emission properties of as-implanted Fe-SiO2 --- p.51 / Chapter 4.3.3 --- Comparison with as-implanted Co-SiO2 --- p.54 / Chapter 4.4 --- Experimental results of annealed Fe-SiO2 samples --- p.57 / Chapter 4.4.1 --- Annealing conditions --- p.57 / Chapter 4.4.2 --- AFM and C-AFM results --- p.57 / Chapter 4.4.3 --- TEM Images --- p.62 / Chapter 4.4.4 --- Field emission properties of annealed Fe-SiO2 --- p.68 / Chapter 4.5 --- Step-like and jump-like features in the J-E plots --- p.81 / Chapter 4.6 --- Field Emission Images --- p.84 / Chapter 4.7 --- Chapter Summary --- p.85 / Chapter Chapter 5 --- Conclusion & Future Plan --- p.87 / Reference --- p.90 / Appendix / Chapter A. --- Derivation of the Fowler Nordheim Equation --- p.97
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_326152 |
| Date | January 2007 |
| Contributors | Yuen, Ying Kit., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xii, 105 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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