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Application of Electron-Beam Lithography to the Fabrication of Electroabsorption Modulators

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Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0630103-122411
Date30 June 2003
CreatorsChen, Hung-Ping
ContributorsTsong-Sheng Lay, Yi-Jen Chiu, Tao-Yuan Chang, Ching-Ting Lee, Wen-Jeng Ho
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0630103-122411
Rightsoff_campus_withheld, Copyright information available at source archive

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