The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality and collimation are individually and jointly optimized for these lenses. Example images for a jointly optimized system are simulated using a combination of ray tracing and Fourier analysis. Even with these non-optimized components, reasonable fidelity is shown to be possible.
| Identifer | oai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/51826 |
| Date | 22 May 2014 |
| Creators | Sedivy, Donald E. |
| Contributors | Gaylord, Thomas K. |
| Publisher | Georgia Institute of Technology |
| Source Sets | Georgia Tech Electronic Thesis and Dissertation Archive |
| Language | en_US |
| Detected Language | English |
| Type | Thesis |
| Format | application/pdf |
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