The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality and collimation are individually and jointly optimized for these lenses. Example images for a jointly optimized system are simulated using a combination of ray tracing and Fourier analysis. Even with these non-optimized components, reasonable fidelity is shown to be possible.
Identifer | oai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/51826 |
Date | 22 May 2014 |
Creators | Sedivy, Donald E. |
Contributors | Gaylord, Thomas K. |
Publisher | Georgia Institute of Technology |
Source Sets | Georgia Tech Electronic Thesis and Dissertation Archive |
Language | en_US |
Detected Language | English |
Type | Thesis |
Format | application/pdf |
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