<div>Fabrication of nanoscale highly periodic structures is a vital capability for research on quasicrystals, directional and specular selective emitters, and plasmonics. Laser interference lithography is a maskless lithography process capable of producing patterns with high periodicity over large areas, and is compatible with standard optical lithography processing. In this work, a Lloyd's mirror lithographic interferometer is simulated, built, and tested. Featuring a HeCd CW laser at 325 nm, spatial lter, and vacuum stage, it is capable of generating patterns with a sub-100 nanometer half pitch, over a large area (approximately 8 cm<sup>2</sup>), with minimal distortion, in a single exposure; with 2D patterns possible using multiple exposures. The interferometer features a compact sliding enclosure, simple alignment and operation, and quick adjustments to the desired period. One-dimensional and two-dimensional patterns were generated and matched well with simulation.</div>
| Identifer | oai:union.ndltd.org:purdue.edu/oai:figshare.com:article/7561916 |
| Date | 12 February 2019 |
| Creators | David J. Kortge (5930708) |
| Source Sets | Purdue University |
| Detected Language | English |
| Type | Text, Thesis |
| Rights | CC BY 4.0 |
| Relation | https://figshare.com/articles/Simulation_Construction_and_Testing_of_a_Lloyd_s_Mirror_Lithographic_Interferometer/7561916 |
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