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Atomic layer deposition of lanthanum based oxides for high-k gate dielectric applications /

Thesis (M.S.)--University of Texas at Dallas, 2008. / Includes vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/311867380
Date January 2008
CreatorsHande, Aarabhi A.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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