As imprint lithography becomes commonplace in industrial manufacturing, the need for fast, reliable modifications to the process are of great importance. In particular, the Roll-to-Roll Nanoimprint Lithography (R2RNIL) method has been proven to yield large areas of continuous, robust patterns in the micro- and nanometer range. A thermal embossing R2RNIL system has been developed that is capable of providing a mold heating rate of 100ºC/s with sufficient temperature control to produce large-area patterns continuously at a rate in excess of four feet per minute. This process uses a novel looped-conveyor mold, allowing longer continuous patterns to be produced with superior temperature control than other methods of R2RNIL. Various patterns in the micro- and nanometer domains were replicated using this process.
| Identifer | oai:union.ndltd.org:UMASS/oai:scholarworks.umass.edu:theses-1259 |
| Date | 01 January 2008 |
| Creators | Fagan, Matthew D |
| Publisher | ScholarWorks@UMass Amherst |
| Source Sets | University of Massachusetts, Amherst |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | Masters Theses 1911 - February 2014 |
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