Optimalizace depozičních parametrů za účelem vytvoření fotokatalytických titanoxidových vrstev metodou PECVD / Optimization of deposition parameters in order to create a photocatalytic titanium oxide films produced by PECVD

Description

This thesis presents Photocatalytic TiOx layers created by own PECVD reactor assembled in the building of Department of Applied Physics and Technics. Parameters of depositions were optimalized as well as the PECVD reactor itself. Final layers are compared to layers made by Degussa P25. As a result based on the included measurements, this thesis tries to answer the question whether PECVD is the suitable method for depositions of photocatalytic layers.

Links & Downloads

1. http://www.nusl.cz/ntk/nusl-153375

Tags

Additional Fields

Identifer	oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:153375
Date	January 2013
Creators	PEKÁREK, Michal
Source Sets	Czech ETDs
Language	Czech
Detected Language	English
Type	info:eu-repo/semantics/masterThesis
Rights	info:eu-repo/semantics/restrictedAccess