by Leung Chi Hung. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1999. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / by Leung Chi Hung. / Acknowledgments --- p.i / Abstract --- p.ii-iii / Table of Contents --- p.iv-v / Figures Caption --- p.vi-xii / Tables Caption --- p.xiii / Chapter 1. --- Introduction / Chapter 1.1 --- "Magnetoresistance (MR),Giant Magnetoresistance (GMR),Colossal Magnetoresistance (CMR) and Their Applications" --- p.1-1 / Chapter 1.2 --- Colossalmagnetoresistance Effect in LCMO --- p.1-5 / Chapter 1.3 --- Significance of Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Film --- p.1-12 / Chapter 1.4 --- The Use of Silver in the YBCO --- p.1-14 / Chapter 1.5 --- Previews --- p.1-15 / Chapter 1.6 --- References --- p.1-17 / Chapter 2. --- Epitixial Growth of Single-Crystal LCMO Thin Film by FTS method / Chapter 2.1 --- Facing-Target Sputtering Method --- p.2-1 / Chapter 2.2 --- Fabrication of LCMO Targets --- p.2-4 / Chapter 2.3 --- Deposition of the LCMO Thin Film / Chapter 2.3.1 --- Deposition Condition --- p.2-6 / Chapter 2.3.2 --- Deposition Process --- p.2-9 / Chapter 2.4 --- X-ray Diffraction Studies and Surface Morphology --- p.2-11 / Chapter 2.5 --- M-S Transition of LCMO Thm Film --- p.2-15 / Chapter 2.6 --- Discussions --- p.2-19 / Chapter 3. --- The Role of Silver in LCMO / Chapter 3.1 --- Reaction between Ag and LCMO --- p.3-1 / Chapter 3.2 --- Grain Size and Transition Temperature in Bulk LCMO --- p.3-9 / Chapter 3.3 --- Improving the Sharpness of Metal - Semiconductor Transition and Crystallinity of LCMO Film --- p.3-15 / Chapter 3.4 --- Stabilization of the LCMO Structure --- p.3-21 / Chapter 3.5 --- Discussions --- p.3-25 / Chapter 4 --- Epitaxial Growth of the Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Film / Chapter 4.1 --- Synthesis Process of the Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Films --- p.4-1 / Chapter 4.2 --- Resistivity and Magnetoresistance --- p.4-6 / Chapter 4.3 --- Thermal Annealing Effects / Chapter 4.3.1 --- Oxygen Annealing Effect --- p.4-15 / Chapter 4.3.1 --- High Pressure Annealing Effect --- p.4-20 / Chapter 4.3.2 --- Vacuum Annealing Effect --- p.4-23 / Chapter 4.4 --- Surface Morphology and Characterization --- p.4-27 / Chapter 4.5 --- Discussions --- p.4-37
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_322761 |
| Date | January 1999 |
| Contributors | Leung, Chi Hung., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, 1 v. (varios paing) : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
Page generated in 0.0021 seconds